Luke T. Gritter, Sergei Yushanov, Jeffrey S. Crompton, and Kyle C. Koppenhoefer
AltaSim Technologies
Columbus, OH
AltaSim Technologies provides engineering consulting services involving advanced multiphysics modeling such as capacitively coupled plasma (CCP). Plasma etching and deposition of thin films, critical processes in the manufacture of advanced microelectronic devices, commonly utilize CCP, in which the plasma is initiated and sustained by an oscillating electric field between two or more electrodes.
Analysis of CCP is difficult due to the dynamic behavior of the plasma and the large number of RF cycles necessary to reach a periodic steady state. By performing one- and two-dimensional simulations of low-frequency RF discharges in axisymmetric CCP reactors for Maxwellian and non-Maxwellian cases using COMSOL Multiphysics, AltaSim Technologies has developed simulations which can be used to assist with the development of new CCP processing technology.
Suggested Stories
Shape Changing Lubricants
Shell Global Solutions UK is conducting research to optimize lubricants for the fuel economy. A problem exists in ...
Multiphysics Protects Wind Turbines when Lightning Strikes
Lightning Technologies, an NTS company, is a world leader in the design and validation of sophisticated lightning ...
Simulation-Based Engineering Fosters Innovation and Invention
Simulation-based engineering is the key to shortening time to market for innovations. Intellectual Ventures, in ...
Simulation Apps Advance Tribology Research
Modeling thermal elastohydrodynamically lubricated (TEHL) gear contacts quickly reveals a complex system of ...
